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VACUUM EQUIPMENT |
Polyus Research & Development Institute has a great experience in development and manufacturing of customized vacuum technological equipment and special systems. Our equipment can be used to solve wide range of technological problems, such as: - deposition of dielectric and protective films; - vacuum welding, casting and annealing; - ion cleaning and etching. We are ready to negotiate about your technical requirements and designs and deliver you required equipment to solve your technological problems. We are ready to negotiate your technical requirements, design and deliver equipment to solve your technological problems. |
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The vacuum annealing system is designed to degas parts and assemblies of electronic devices in high oil-free vacuum under high-temperature heating. The system provides possibility to pump down charge and operating chambers in manual and automatic modes, to program, indicate, and record changes in resistance heater temperature. |
| Residual pressure in charge chamber | 6.6 x 10-3 Pa |
| Residual pressure in operating chamber | 6.6 x 10-6 Pa |
| Maximum temperature in charge chamber | 250 °C |
| Maximum temperature in operating chamber | 900 °C |
| Accuracy of temperature keeping in operating area | ± 10 °C |
| Dimensions of operating area | 180 x 250 mm |
| Maximum power consumption | no more than 40 kW |
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The indium preparation and deposition system is designed for indium layers deposition on cement packages of electrovacuum devices in high vacuum. The system provides hydrocarbons-free high-vacuum pumping and fine-programmed indium melting and casting into 6 packages simultaneously. |
| Ultimate vacuum | 1.3 x 10-6 Pa |
| Rate of temperature rise | 5 °C/min |
| Maximum temperature in operating chamber | 360 °C |
| Accuracy of temperature keeping | ± 5 °C |
| Residual pressure in operating chamber at 360°c | no more than 6.6 x 10-4 Pa |
| Residual pressure in heated and degassed operating chamber in 24 hours after pumping stop | no more than1.3 x 10-2 Pa |
| Maximum power consumption | no more than 15 kW |
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The vacuum system for thermocompression welding is used for vacuum-tight joint of heteroepitaxial structures with glass substrates by thermocompression welding in vacuum. The vacuum system for thermocompression welding consists of the following main parts:
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| Parameter | Value |
|---|---|
| Minimum residual pressure in vacuum technological chamber at 20 °C after preheating pumping system and chamber | 4x10-6 Pa (5x10-8 mm Hg) |
| Time to achieve minimum residual pressure | < 4 hours |
| Operating residual pressure at 650 °C in technological chamber | 100...700 °C |
| Temperature range in operating area | 700 + 20 °C |
| Maximum temperature in operating area | 10 °/min |
| Maximum temperature rise in operating area | ± 3 °C |
| Temperature stability in operating area | 0...20 kg-force |
| Range of pressing force on welded parts | no more than 1.3 x 10-2 Pa |
| Power consumption | 15 kW |
3 Vvedensky St., Moscow, 117342, Russia
tel:+7 095 3330389 fax:+7 095 3330256
e-mail: mail@polyus.msk.ru